Canon to launch its first back-end semiconductor manufacturing tool FPA-5510iV for 3D packaging

New optics system designed for TSV and Bump

Press Release

FPA-5510iV






July 7, 2011


TOKYO, July 7, 2011—Canon Inc. announced today its entry into the semiconductor back-end manufacturing tool market with the launch of the FPA-5510iV for next-generation semiconductor packaging, which goes on sale today.

As smart phones, tablet PCs and other electronic devices become progressively smaller and more intelligent, the demand for integration and shrinkage on semiconductor devices continues to increase. One way to realize such integration is to employ a three-dimensional layout of chips, layering multiple semiconductor chips vertically and interconnecting the chips to configure a single device. To facilitate this interconnection, the industry has developed Through Silicon Via (TSV) and Bump processes, enabling multifold increases of memory capacity, high-speed data transfer, and reduced electricity consumption in a smaller layout area.

The launch of the new Canon FPA-5510iV semiconductor lithography tool accommodates the industry's TSV and Bump process needs. The tool, which utilizes the technology cultivated through the company's best-selling FPA-5500iZ front-end tool series, marks Canon's first-ever back-end lithography stepper. The tool delivers high resolution, high throughput, and high overlay accuracy to meet the rapidly progressing device demands on performance and integration.



New optics system designed for TSV and Bump
Because the resist film used in the TSV and Bump processes is relatively thick, the FPA-5510iV is equipped with an optimized Numerical Aperture for the thickness with a pattern size of one to several tens of microns, and realizes small and deep vertical holes in the thick resist. The Numerical Aperture is adjustable to handle various patterns, controlling the image depth of focus, resolution and resist profile.



High productivity
The FPA-5510iV features a large exposure area and high-intensity light exposure to deliver high-productivity performance. The system's projection lens optics expose an area measuring 52 x 34 mm, compared with the 26 x 33 mm area exposed by front-end tools, and the illumination optics utilize a 4.5kW high-intensity lamp as the light source.







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