Deposition Sciences Increases Photolithography Patterning Capacity

New 200 mm diameter wafer enhances photolithography capability

200 mm Photolithography Patterned Wafer

200 mm Photolithography Patterned Wafer





March 4, 2013

March 4, 2013 – Santa Rosa, CA – Deposition Sciences, Inc. (DSI®), manufacturer of highly durable thin film optical coatings, introduces an enhanced capability to manufacture patterned optical filters. DSI has increased its capacity and resolution with the introduction of a new photolithography production line capable of patterning 200 mm diameter wafers.

Director of marketing and sales, Michael Newell, notes, “We are very excited to announce this enhanced capability. This new manufacturing line brings us better resolution, increased capacity, an ability to yield and coat more parts per wafer, and ultimately better pricing for our customers. And we are keeping pace with the semi-conductor industry. Customers are looking to integrate their electronics with the optical filters. DSI can pattern populated wafers containing active devices, and semi-conductor fab houses are doing more and more at the 200 mm wafer scale.”

The new patterning capability provides an enhanced view or enhanced detection in multi-spectral imaging tasks by fusing together information from different wavelength bands. Other applications include satellite imaging, UAV overhead reconnaissance, machine vision, food and industrial inspection, automotive, biomedical sensing, color filter arrays for CCD and CMOS cameras, reticles, and more. For more information on DSI’s 200 mm diameter photolithography patterning capability, please visit: www.depsci.com.

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